![Materials | Free Full-Text | Review on Non-Volatile Memory with High-k Dielectrics: Flash for Generation Beyond 32 nm Materials | Free Full-Text | Review on Non-Volatile Memory with High-k Dielectrics: Flash for Generation Beyond 32 nm](https://www.mdpi.com/materials/materials-07-05117/article_deploy/html/images/materials-07-05117-g001.png)
Materials | Free Full-Text | Review on Non-Volatile Memory with High-k Dielectrics: Flash for Generation Beyond 32 nm
![Charge‐Trap Flash‐Memory Oxide Transistors Enabled by Copper–Zirconia Composites - Baeg - 2014 - Advanced Materials - Wiley Online Library Charge‐Trap Flash‐Memory Oxide Transistors Enabled by Copper–Zirconia Composites - Baeg - 2014 - Advanced Materials - Wiley Online Library](https://onlinelibrary.wiley.com/cms/asset/1431df06-f057-4088-b77a-0afb8b66fd3e/adma201401354-gra-0001-m.jpg)
Charge‐Trap Flash‐Memory Oxide Transistors Enabled by Copper–Zirconia Composites - Baeg - 2014 - Advanced Materials - Wiley Online Library
![Program/Erase Cycling Enhanced Lateral Charge Diffusion in Triple-Level Cell Charge-Trapping 3D NAND Flash Memory | Semantic Scholar Program/Erase Cycling Enhanced Lateral Charge Diffusion in Triple-Level Cell Charge-Trapping 3D NAND Flash Memory | Semantic Scholar](https://d3i71xaburhd42.cloudfront.net/61f73d604428797ff2fe3960d7cf972554fdc0f8/1-Figure1-1.png)
Program/Erase Cycling Enhanced Lateral Charge Diffusion in Triple-Level Cell Charge-Trapping 3D NAND Flash Memory | Semantic Scholar
![Characterization Summary of Performance, Reliability, and Threshold Voltage Distribution of 3D Charge-Trap NAND Flash Memory | ACM Transactions on Storage Characterization Summary of Performance, Reliability, and Threshold Voltage Distribution of 3D Charge-Trap NAND Flash Memory | ACM Transactions on Storage](https://dl.acm.org/cms/asset/7e15ef92-c520-464d-94fc-9482d428892f/tos1802-16-f01.jpg)
Characterization Summary of Performance, Reliability, and Threshold Voltage Distribution of 3D Charge-Trap NAND Flash Memory | ACM Transactions on Storage
![Figure 1 from Dual-Gate Charge Trap Flash Memory for Highly Reliable Triple Level Cell Using Capacitive Coupling Effects | Semantic Scholar Figure 1 from Dual-Gate Charge Trap Flash Memory for Highly Reliable Triple Level Cell Using Capacitive Coupling Effects | Semantic Scholar](https://d3i71xaburhd42.cloudfront.net/ed3cde3f48abebff3367cd66f06a4a82f3f505ef/2-Figure1-1.png)
Figure 1 from Dual-Gate Charge Trap Flash Memory for Highly Reliable Triple Level Cell Using Capacitive Coupling Effects | Semantic Scholar
![Color online) Schematic energy band diagram of fully programed charge... | Download Scientific Diagram Color online) Schematic energy band diagram of fully programed charge... | Download Scientific Diagram](https://www.researchgate.net/publication/224405656/figure/fig4/AS:289182019801143@1445957775026/Color-online-Schematic-energy-band-diagram-of-fully-programed-charge-trapping-flash.png)
Color online) Schematic energy band diagram of fully programed charge... | Download Scientific Diagram
![Figure 4 from Nonvolatile Poly-Si TFT Charge-Trap Flash Memory With Engineered Tunnel Barrier | Semantic Scholar Figure 4 from Nonvolatile Poly-Si TFT Charge-Trap Flash Memory With Engineered Tunnel Barrier | Semantic Scholar](https://d3i71xaburhd42.cloudfront.net/854fb82eece006ccca7593aa6e0e581fd9a117b4/3-Figure4-1.png)
Figure 4 from Nonvolatile Poly-Si TFT Charge-Trap Flash Memory With Engineered Tunnel Barrier | Semantic Scholar
![Investigating the Reasons for the Difficult Erase Operation of a Charge‐Trap Flash Memory Device with Amorphous Oxide Semiconductor Thin‐Film Channel Layers - Kim - 2021 - physica status solidi (RRL) – Rapid Investigating the Reasons for the Difficult Erase Operation of a Charge‐Trap Flash Memory Device with Amorphous Oxide Semiconductor Thin‐Film Channel Layers - Kim - 2021 - physica status solidi (RRL) – Rapid](https://onlinelibrary.wiley.com/cms/asset/47885938-e74a-4626-9c0b-274237d15768/pssr202000549-blkfxd-0001-m.jpg?trick=1707481158125)
Investigating the Reasons for the Difficult Erase Operation of a Charge‐Trap Flash Memory Device with Amorphous Oxide Semiconductor Thin‐Film Channel Layers - Kim - 2021 - physica status solidi (RRL) – Rapid
![Floating-Gate and Charge-Trap NAND flash cell structure (a), 3D NAND... | Download Scientific Diagram Floating-Gate and Charge-Trap NAND flash cell structure (a), 3D NAND... | Download Scientific Diagram](https://www.researchgate.net/publication/324883774/figure/fig3/AS:655014339035140@1533178996871/Floating-Gate-and-Charge-Trap-NAND-flash-cell-structure-a-3D-NAND-design-b-and.png)